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Quantum confinement in amorphous TiO 2 films studied via atomic layer deposition

✍ Scribed by King, David M; Du, Xiaohua; Cavanagh, Andrew S; Weimer, Alan W

Book ID
124160894
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
505 KB
Volume
19
Category
Article
ISSN
0957-4484

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Atomic layer deposition (ALD) of controlled-thickness TiO 2 films was carried out on particle substrates in a fluidized bed reactor for the first time. Films were deposited on 550 nm SiO 2 spheres and 65 nm ZnO nanoparticles for enhanced optical properties. Nanoparticles were fluidized with the assi