✦ LIBER ✦
Quantum Chemical Investigation for Chemical Dry Etching of SiO$_{2}$ by Flowing NF$_{3}$ into H$_{2}$ Downflow Plasma
✍ Scribed by Hayashi, Toshio; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Kono, Akihiro; Suu, Koukou
- Book ID
- 115450331
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2011
- Tongue
- English
- Weight
- 624 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0021-4922
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