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Quantitative Secondary Ion Mass Spectrometry Analysis of Carbon and Fluorine Impurities on Silicon Wafers Stored in Polymer Carrier Cases

✍ Scribed by Yamazaki, Hideyuki; Tamaoki, Makiko; Oohashi, Masaya

Book ID: 127053702
Publisher: Institute of Pure and Applied Physics
Year: 2000
Tongue: English
Weight: 167 KB
Volume: 39
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.39.4744

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✍ Yamazaki, Hideyuki; Takahashi, Mamoru 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 262 KB 👁 2 views

Quantitative analysis of the native oxide on silicon wafers has been investigated by secondary ion mass spectrometry (SIMS) combined with an encapsulation method. In the encapsulation technique, the sample surface is covered with a thin Ðlm whose material is identical to that of the substrate of the