To investigate processes occurring during thin-film deposition by plasma chemical vapor deposition, a study was made of the radical species in an RF CHdH\* plasma using photoionization mass spectrometry. The method avoids fragmentation of particles as can occur in conventional mass spectrometry by u
Quadrupole mass spectrometric study of positive ions from RF plasmas of pure CH4, CH4/H2, and CH4/Ar systems
β Scribed by Wei Zhang; Yves Catherine
- Publisher
- Springer
- Year
- 1991
- Tongue
- English
- Weight
- 585 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0272-4324
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Both positive and negative plasma desorption mass spectra of the three-dimensionally non-molecular material [ Cd(SC,H,-2-CH3)2] contain fragment ions directly related to the lattice structure of the material. Fragment ions are observed which correspond with [ CdSC,H, I +' and [ CdS,C,H, I -' which d