Pure element sputtering yields using 500–1000 eV argon ions

Sputtering yield of chromium by argon an

Sputtering yield of chromium by argon and xenon ions with energies from 50 to 500 eV

✍ A. K. Handoo; P. K. Ray 📂 Article 📅 1992 🏛 Springer 🌐 English ⚖ 286 KB

A radioactive tracer technique is described for the quantitative measurement of the sputtering yield of a target material electroplated on a copper substrate. Sputtering yields of chromium by argon and xenon ions with energies from 50 to 500eV are reported. The ion beams, having a current density ra