Prototype hand-held probe

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 96 KB
• Volume: 12
• Category: Article
• ISSN: 1369-7021
• DOI: 10.1016/s1369-7021(09)70082-3

✦ Synopsis

The JEOL JBX-6300FS direct write ebeam system is capable of writing line widths down to 8 nm on substrates up to 200 mm in diameter in both nanolithography and high throughput mode. It is a spot beam, vector scan, step and repeat lithography system designed for small volume production as well as research and design or "sandbox lithography." The JBX-6300FS excels at nano-imprint lithography (NIL), a method of fabricating next-generation nanometer scale patterns onto 65 mm photo mask templates and finally creating the high resolution patterns directly on wafers through a 1X nanoimprint process.