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Proton beam micromachined buried microchannels in negative tone resist materials

✍ Scribed by I. Rajta; M. Chatzichristidi; E. Baradács; C. Cserháti; I. Raptis; K. Manoli; E.S. Valamontes


Book ID
103862085
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
622 KB
Volume
260
Category
Article
ISSN
0168-583X

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✦ Synopsis


In the present work the Atomki, Debrecen microprobe facility has been used to write long tilted structures by 2 MeV protons. For the formation of the structures, two exposures have been carried out at +20°and À20°using a goniometer stage sample holder. The tilted structures were resolved in the negative tone resist materials SU-8 and ADEPR (an aqueous base developable chemically amplified resist). The length of the microchannels was varied between 100 lm and 1000 lm, the wall thickness was less than 10 lm. By applying the developed methodology it was possible to resolve the desired layout through the whole length of the channel.