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Proton and alpha track profiles in CR39 during etching and their implications on track etching models

โœ Scribed by M. Fromm; F. Membrey; A. Chambaudet; R. Saouli

Book ID
108044848
Publisher
Elsevier Science
Year
1991
Weight
387 KB
Volume
19
Category
Article
ISSN
1359-0189

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Effect of pre-etching on the registratio
Effect of pre-etching on the registration in CR-39 of electrochemically-etched tracks of protons and alpha particles of different energies
โœ W.G. Cross; A. Arneja; H. Ing ๐Ÿ“‚ Article ๐Ÿ“… 1984 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 348 KB

The amount of pre-etchlng needed to register electrochemlcally-etched (ECE) tracks efficiently in CR-39 varies with the particle LET. This dependence was studied for monoenergetlc alpha particles from i to 5.5 MeV and protons from 0.4 to 13.8 MeV. Pre-etchlng must be between upper and lower limits,