Properties of the SiH bond-stretching absorption band in a-Si:H grown by remote plasma enhanced CVD (RPECVD)

✍ Scribed by D.V. Tsu; G. Lucovsky

• Book ID: 118334056
• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 176 KB
• Volume: 97-98
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/0022-3093(87)90201-8