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Properties of low anodization voltage thin-film capacitors based on α-Ta with nitrogen concentrations between 14 and 30 atomic percent : Myron H. Rottersman, Raymond C. Pitetti, A. Robert Adolt and Michael J. Bill. IEEE Trans. Components, Hybrids, Manuf. Technol.CHMT-3 (4) 500 (December 1980)


Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
92 KB
Volume
21
Category
Article
ISSN
0026-2714

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