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Properties of hydrogenated amorphous SiN films prepared by r.f. magnetron sputtering with emphasis on the non-stoichiometric region

✍ Scribed by Ratnabali Banerjee; A.K. Bandyopadhyay; J.K. Rath; A.K. Batabyal; A.K. Barua


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
550 KB
Volume
192
Category
Article
ISSN
0040-6090

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