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Properties of Films of Adsorbed Fluorinated Acids

โœ Scribed by Hare, E. F.; Shafrin, E. G.; Zisman, W. A.


Book ID
120822384
Publisher
American Chemical Society
Year
1954
Tongue
English
Weight
493 KB
Volume
58
Category
Article
ISSN
0022-3654

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Fluorinated SiO (SiOF) films, prepared by plasma enhanced chemical vapour deposition from SiH , N O and CF 2 4 2 4 precursors, have been analysed by infrared (IR) spectroscopy and X-ray photoelectron spectroscopy (XPS) to extract chemical and structural information. Notwithstanding XPS reveals that