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Properties of CoFe2O4 Films Prepared by Annealing Co/Fe Multilayered Films in the Atmosphere

✍ Scribed by Ebisawa, T.; Tokushige, H.; Miyagawa, T.

Book ID
119818878
Publisher
Institute of Electrical and Electronics Engineers
Year
1992
Weight
899 KB
Volume
7
Category
Article
ISSN
0882-4959

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## Abstract CoFe~2~O~4~ films of 100 nm thickness were deposited on 20 nm, rf magnetron‐sputtered Fe~3~O~4~ underlayers on naturally oxidized Si (100) substrates. These films were then annealed, and the magnetic properties and microstructures were investigated as a function of annealing temperature