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Processing assessment and adhesion evaluation of copper through-silicon vias (TSVs) for three-dimensional stacked-integrated circuit (3D-SIC) architectures

✍ Scribed by Y. Yang; R. Labie; F. Ling; C. Zhao; A. Radisic; J. Van Olmen; Y. Travaly; B. Verlinden; I. De Wolf


Book ID
108210878
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
677 KB
Volume
50
Category
Article
ISSN
0026-2714

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