We compare the various nanowire fabrication processes for MgB 2 ultra-thin films: Ar ion beam milling with or without a protective layer (Au and SiO 2 ), an reactive ion etching (RIE) with fluorine-based gas, and a liftoff process using an Si/C bilayer mask. With Ar milling, we can fabricate nanowir
β¦ LIBER β¦
Processed Magnesium Diboride Tapes
β Scribed by Braccini, V.; Malagoli, A.; Tumino, A.; Vignolo, M.; Bernini, C.; Fanciulli, C.; Romano, G.; Tropeano, M.; Siri, A.S.; Grasso, G.
- Book ID
- 126507277
- Publisher
- IEEE
- Year
- 2007
- Tongue
- English
- Weight
- 338 KB
- Volume
- 17
- Category
- Article
- ISSN
- 1051-8223
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