Process optimisation for direct formation of device worthy thin film SIMOX structures using 90 keV oxygen implantation

✍ Scribed by A. Nejim; Y. Li; C.D. Marsh; P.L.F. Hemment; R.J. Chater; J.A. Kilner; L.F. Giles; G.R. Booker

• Book ID: 113283675
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 607 KB
• Volume: 74
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(93)95037-6