Process design for plasma etching of polysilicon/silicon nitride/polysilicon sandwich structures for sensor applications

✍ Scribed by Y.X. Li; M. Laros; P.M. Sarro; P.J. French; R.F. Wolffenbuttel

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 631 KB
• Volume: 20
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(93)90009-t