Process damage-free damascene metal gate technology for gentle integration of epitaxially grown high-k

✍ Scribed by Ralf Endres; Yordan Stefanov; Frank Wessely; Florian Zaunert; Udo Schwalke

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 962 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.03.008