𝔖 Bobbio Scriptorium

✦ LIBER ✦

Process control in the semiconductor manufacturing environment using a high pressure quadrupole mass spectrometer

✍ Scribed by ME Buckley

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 354 KB
Volume: 44
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(93)90120-y

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

High-frequency mass spectrometer used as

High-frequency mass spectrometer used as a gas-analytical flow meter for improving, monitoring and controlling processes carried out in vacuum

📂 Article 📅 1966 🏛 Elsevier Science 🌐 English ⚖ 214 KB

495. The application of the atlas quadru

495. The application of the atlas quadrupole mass spectrometer type AMP3 for partial pressure measurements in high-vacuum systems: H. J. Bultemann and L. Delgmann, 2nd European Vac. Symp., 5–7 June 1963, 213–222, (R. A. Lang Verlag)

📂 Article 📅 1964 🏛 Elsevier Science 🌐 English ⚖ 97 KB