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Process characterization and statistical analysis of oxide CMP on a silicon wafer with sparse data

✍ Scribed by S.T.S. Bukkapatnam; P.K. Rao; W.-C. Lih; N. Chandrasekaran; R. Komanduri


Publisher
Springer
Year
2007
Tongue
English
Weight
595 KB
Volume
88
Category
Article
ISSN
1432-0630

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