Principles of Plasma Discharges and Materials Processing, Second Edition

✍ Scribed by Michael A. Lieberman, Allan J. Lichtenberg(auth.)

• Year: 2005
• Tongue: English
• Leaves: 777
• Category: Library

✦ Synopsis

A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:
* Updated cross sections
* Diffusion and diffusion solutions
* Generalized Bohm criteria
* Expanded treatment of dc sheaths
* Langmuir probes in time-varying fields
* Electronegative discharges
* Pulsed power discharges
* Dual frequency discharges
* High-density rf sheaths and ion energy distributions
* Hysteresis and instabilities
* Helicon discharges
* Hollow cathode discharges
* Ionized physical vapor deposition
* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.Content:
Chapter 1 Introduction (pages 1–22):
Chapter 2 Basic Plasma Equations and Equilibrium (pages 23–42):
Chapter 3 Atomic Collisions (pages 43–85):
Chapter 4 Plasma Dynamics (pages 87–132):
Chapter 5 Diffusion and Transport (pages 133–163):
Chapter 6 Direct Current (DC) Sheaths (pages 165–206):
Chapter 7 Chemical Reactions and Equilibrium (pages 207–233):
Chapter 8 Molecular Collisions (pages 235–283):
Chapter 9 Chemical Kinetics and Surface Processes (pages 285–325):
Chapter 10 Particle and Energy Balance in Discharges (pages 327–386):
Chapter 11 Capacitive Discharges (pages 387–460):
Chapter 12 Inductive Discharges (pages 461–489):
Chapter 13 Wave?Heated Discharges (pages 491–534):
Chapter 14 Direct Current (DC) Discharges (pages 535–569):
Chapter 15 Etching (pages 571–617):
Chapter 16 Deposition and Implantation (pages 619–648):
Chapter 17 Dusty Plasmas (pages 649–677):
Chapter 18 Kinetic Theory of Discharges (pages 679–721):