N2O decay has been monitored via infrared emission for a series of mixtures containing N20/Ar and N20/H2/Ar. These mixtures were studied behind reflected shock waves in the temperature interval of 1950-3075' K with total concentrations ranging from 1.2 to 2.5 X 1OI8 molec/cm3. In all cases the N2O d
Pressure dependence of the mutual diffusion coefficients of the binary systems N2 + Ar, N2 + O2, O2 + Ar and Ar + Kr at 300 and 323 K
β Scribed by Ian R. Shankland; Peter J. Dunlop
- Book ID
- 108002516
- Publisher
- Elsevier Science
- Year
- 1980
- Tongue
- English
- Weight
- 704 KB
- Volume
- 100
- Category
- Article
- ISSN
- 0378-4371
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π SIMILAR VOLUMES
Reflected shock waves were used to heat N20/C2H6/CO/Ar and N20/CH4/CO/Ar mixtures to temperatures of 1875-2855 K at total concentrations of 5 Γ 1018 cm -a. Oxygen atom production was monitored via the flame band emission at 450 nm, and CO 2 production was observed at 4.27 tzm. These data were then c
Emissions at 450 nm and 4.27 ~sm have been measured when a vaxiety of mixtures containing H 2, CO. either 02 or NaO, and Ar were heated behind reflected shock waves to temperatures of 2000-2850 K and total concentrations near 5 x 101| molecule/era 3. These emissions were used to obtain absolute con
Using ;I two-bulb apparatus and a scnsitlvc thcrmigtor bridge an attempt was made to find a longitudinal Scnftlcben-Bxnakkcr cffcct at 300 K m diffusion in the syystcms tic-02 and Ar-02. V&ICS ofYIf/P as large BS 400 C torr-\* wete employed but no cffcct was found within the c\timatcd error of ?0.0
## Using accurate binary diffusion coefficients, obtained over a tempcrnture range of fifty degrees, togcthcr with the virial coefficients in the literature. potential parametcrc have been obtained for the (11,6. 8, y = 3) potential for the systems Ne-Ar and Ar-Kr. rhese pammeters accurately predi