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Preparation of Magnetic Oxide Films by Sputtering Method

โœ Scribed by Imagawa, T.; Narishige, S.; Hanazono, M.


Book ID
119817612
Publisher
Institute of Electrical and Electronics Engineers
Year
1985
Weight
185 KB
Volume
1
Category
Article
ISSN
0882-4959

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Preparation of molybdenum oxide film by
โœ D.J. Kwak; E. Kuantama; D.W. Han; Y.M. Sung ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 715 KB

In this work, molybdenum oxide (MoO 3 ) films were prepared by a magnetic null discharge (MND) sputtering system and some fundamental properties by XRD, XPS and SEM analysis were investigated. The initial and mean insulation resistances of the sample with MoO 3 film were about 1.4 Mฮฉ and 800 kฮฉ, res