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Preparation of highly photosensitive hydrogenated amorphous Si-Ge alloys using a triode plasma reactor

✍ Scribed by A. Matsuda; K. Yagii; M. Koyama; M. Toyama; Y. Imanishi; N. Ikuchi; K. Tanka

Book ID: 126669564
Publisher: American Institute of Physics
Year: 1985
Tongue: English
Weight: 529 KB
Volume: 47
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.96379

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