✦ LIBER ✦
Preparation of High-Quality Colloidal Mask for Nanosphere Lithography by a Combination of Air/Water Interface Self-Assembly and Solvent Vapor Annealing
✍ Scribed by Yu, Jie; Geng, Chong; Zheng, Lu; Ma, Zhaohui; Tan, Tianya; Wang, Xiaoqing; Yan, Qingfeng; Shen, Dezhong
- Book ID
- 118150561
- Publisher
- American Chemical Society
- Year
- 2012
- Tongue
- English
- Weight
- 517 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0743-7463
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