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Preparation of dense SiO2 films by low-temperature decomposition of tetraethoxysilane: P S Agalarzade et al, Neorg Mater, 7 (11), 1971, 1975–1977 (in Russian)


Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
170 KB
Volume
22
Category
Article
ISSN
0042-207X

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