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Preparation of a stable silica membrane by a counter diffusion chemical vapor deposition method

✍ Scribed by Mikihiro Nomura; Kenta Ono; Suraj Gopalakrishnan; Takashi Sugawara; Shin-Ichi Nakao

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 248 KB
Volume: 251
Category: Article
ISSN: 0376-7388
DOI: 10.1016/j.memsci.2004.11.008

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