Mechanical properties of a-C:H/Si-contai
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C. Chouquet; C. Ducros; S. Barrat; A. Billard; F. Sanchette
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Article
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2008
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Elsevier Science
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English
β 567 KB
Amorphous hydrogenated carbon (a-C:H), Si-containing a-C:H and a-C:H/Si-containing a-C:H multilayered films have been deposited by low frequency plasma enhanced chemical vapour deposition (LF-PECVD) from cyclohexane and/or tetramethylsilane gas mixtures. Structural and mechanical properties of singl