Adhesion, friction and consequent wear of sliding surfaces are the basic problems that limit the performance and reliability of microelectromechanical devices. Lubrication of these nano-and microscale contacts is different from traditional lubricants. Self-assembled monolayers (SAMs) chemically bonded to the substrate are considered to be the best solution of lubrication. The majority of these monolayers are hydrophobic providing low friction, adhesion and wear.
Chemical vapor deposition was used to grow a fluorosilane film on silicon Si(1 0 0) and a condensed monolayer of 3-mercaptopropyltrimethoxysilane (MPTMS) on Au(1 1 1). The films were characterized by means of a contact angle analyzer for hydrophobicity, and time-of-flight secondary ion mass spectrometry (ToF-SIMS) for identification of thin fluoroorganic monolayers deposited on silica surfaces and condensed monolayer MPTMS. Adhesion and friction measurements were performed using atomic force microscopy (AFM) and compared with measurements performed using a microtribometer operating in millinewton (mN) normal load range. Nanotribological measurements indicated that silica and MPTMS modified by fluorosilanes have the lowest friction coefficient and indicated a decrease friction coefficient with increasing fluoric alkyl chain length.