Preparation and properties of nickel silicide layers by the diffusion and CVD processes using Si2Cl6as a source of silicon

✍ Scribed by Seiji Motojima; Masanori Kohno; Tatsuhiko Hattori

• Publisher: Springer
• Year: 1987
• Tongue: English
• Weight: 700 KB
• Volume: 22
• Category: Article
• ISSN: 0022-2461
• DOI: 10.1007/bf01160767