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Preparation and Characterization of Novel Polymers Having Pendant Ketal Moieties for Positive Photoresists

โœ Scribed by Jui-Hsiang Liu; Jen-Chieh Shih


Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
114 KB
Volume
202
Category
Article
ISSN
1022-1352

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Preparation and characterization of phot
โœ Jui-Hsiang Liu; Seng-Hei Lin; Jen-Chieh Shih ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 189 KB ๐Ÿ‘ 1 views

tert-Butyl methacrylate (TBMA) was copolymerized with various comonomers that were selected from methyl methacrylate (MMA), n-butyl acrylate (NBA), acrylic acid (AA), and 2-hydroxyethyl methacrylate (HEMA). From film physical properties, poly(TBMA-co-HEMA) and poly(TBMA-co-AA-co-NBA), were selected