The rapidly increasing use of low-temperature, non-equilibrium plasmas in many technological applications has stimulated a renewed interest in fundamental studies of the physics and chemistry of low-temperature plasmas. Up to now, the technological applications of low-temperature plasmas have largel
โฆ LIBER โฆ
Preface by the Guest Editors
โ Scribed by A. Lunk; U. Schumacher
- Publisher
- John Wiley and Sons
- Year
- 1999
- Tongue
- English
- Weight
- 148 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0005-8025
No coin nor oath required. For personal study only.
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