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Precise nonselective chemically assisted ion-beam etching of AlGaAs/GaAs Bragg reflectors byin situlaser reflectometry

✍ Scribed by J. Y. Yoo; J. H. Shin; Y. H. Lee; H. -H. Park; B. -S. Yoo


Publisher
Springer
Year
1995
Tongue
English
Weight
446 KB
Volume
27
Category
Article
ISSN
0306-8919

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