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Praseodymium Silicate as a High-k Dielectric Candidate: An Insight into the Pr2O3-Film/Si-Substrate Interface Fabricated Through a Metal–Organic Chemical Vapor Deposition Process

✍ Scribed by R. Lo Nigro; R. G. Toro; G. Malandrino; G. G. Condorelli; V. Raineri; I. L. Fragalà


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
362 KB
Volume
15
Category
Article
ISSN
1616-301X

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