Positron annihilation study of low pressure chemical vapor deposited silicon nitride films: Hakvoort, R.A.; Schut, H.; van Veen, A.; Bik, W.M.A.; Habraken, F.H.P.M. Applied Physics Letters, Vol. 59, No. 14, pp. 1687–1689 (30 Sep. 1991)

• Book ID: 113407763
• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 143 KB
• Volume: 27
• Category: Article
• ISSN: 0963-8695
• DOI: 10.1016/0963-8695(94)90155-4