✦ LIBER ✦
Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography
✍ Scribed by R. G. Tarascon; E. Reichmanis; F. M. Houlihan; A. Shugard; L. F. Thompson
- Publisher
- Society for Plastic Engineers
- Year
- 1989
- Tongue
- English
- Weight
- 632 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0032-3888
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