Polysilicon produced by excimer (ArF) laser crystallisation and low-temperature (600°C) furnace crystallisation of hydrogenated amorphous silicon (a-Si:H)

✍ Scribed by T.E. Dyer; J.M. Marshall; W. Pickin; A.R. Hepburn; J.F. Davies

• Book ID: 115989299
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 361 KB
• Volume: 164-166
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/0022-3093(93)91167-2