<br> Content: A sensitive positive-working cross-linked methacrylate electron resist / E.D. Roberts --<br/> Radiation degradation and film solubility rates of poly(butene-1-sulfone) / Larry Stillwagon --<br/> Poly(methyl methacrylate-co-3-oximino-2-butanone methacrylate-co-methacrylonitrile) : a dee
Polymers for electronic applications
β Scribed by Lai, Juey H
- Publisher
- CRC Press
- Year
- 1989
- Tongue
- English
- Leaves
- 247
- Edition
- 1
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Synopsis
A CRC technical reference on the use of polymers as resists in the fabrication of integrated circuits. A resist is the material in the pattern of a circuit that does down on the raw Silicon wafer. The wafer is treated to change the solubility of the material not under the resist, which "resists." The changed material is washed away. The work is primarily chemical with numerous graphs but it does not stint from mathematics where required
β¦ Subjects
KUNSTSTOFFE (WERKSTOFFE);HALBLEITERBAUELEMENTE + ELEKTRONISCHE BAUELEMENTE (ELEKTRONIK);MATIEΜRES PLASTIQUES (TECHNOLOGIE DES MATEΜRIAUX);PLASTICS (MATERIALS);EΜLEMENTS SEMI-CONDUCTEURS + COMPOSANTS EΜLECTRONIQUES (EΜLECTRONIQUE);SEMICONDUCTOR COMPONENTS + ELECTRONIC COMPONENTS (ELECTRONICS)
π SIMILAR VOLUMES
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