Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference. Contents: Block Copolymer Thin Films (J-Y Wang et al.); Equilibration of Block Copolymer Films on Chemically Patterned Surfaces (G S W Craig et al.); Structure Formation and Evolution in Confined Cylinder-Forming Block Copolymers (G J A Sevink & J G E M Fraaije); Block Copolymer Lithography for Magnetic Device Fabrication (J Y Cheng & C A Ross); Hierarchical Structuring of Polymer Nanoparticles by Self-Organization (M Shimomura et al.); Wrinkling Polymers for Surface Structure Control and Functionality (E P Chan & A J Crosby); Crystallization in Polymer Thin Films: Morphology and Growth (R M Van Horn & S Z D Cheng); Friction at Soft Polymer Surface (M K Chaudhury et al.); Relationship Between Molecular Architecture, Large-Strain Mechanical Response and Adhesive Performance of Model, Block Copolymer-Based Pressure Sensitive Adhesives (C Creton & K R Shull); Stability and Dewetting of Thin Liquid Films (K Jacobs et al.); Anomalous Dynamics of Polymer Films (O K C Tsui).