Poly(hydrosilane)s as Sources of Silyl Radicals and Their Use as Polymerization-Initiating Structures

✍ Scribed by Jacques Lalevée; Ravi Shankar; Mohamad Ali Tehfe; Usharani Sahoo; Jean Pierre Fouassier

• Publisher: John Wiley and Sons
• Year: 2011
• Tongue: English
• Weight: 437 KB
• Volume: 212
• Category: Article
• ISSN: 1022-1352
• DOI: 10.1002/macp.201000684

✦ Synopsis

Abstract

Poly(hydrosilane)s, [R(H)Si]~n~ [R = Ph, Si(CH~2~)~3~SiMe~2~Th, cy‐Hex], are investigated as sources of silyl radicals. The Si–H bonds in these oligomers exhibit good to excellent hydrogen donating properties which ensure the formation of reactive silyl radicals. For free radical photopolymerization, the polymerization initiating properties of these structures are checked. These polymers are found to be advantageous to overcome the classical oxygen inhibition of the FRP process. Their ability in FRPCP is also evaluated for an epoxy monomer. The mechanisms are investigated through ESR and laser flash photolysis experiments.
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