𝔖 Bobbio Scriptorium
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Polycrystalline silicon thin film transistors fabricated at reduced thermal budgets by utilizing fluorinated gate oxidation

✍ Scribed by Kouvatsos, D.N.; Hatalis, M.K.


Book ID
114536573
Publisher
IEEE
Year
1996
Tongue
English
Weight
691 KB
Volume
43
Category
Article
ISSN
0018-9383

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