Polishing behaviors of single crystalline ceria abrasives on silicon dioxide and silicon nitride CMP

✍ Scribed by Myoung-Hwan Oh; Rajiv K. Singh; Sushant Gupta; Seung-Beom Cho

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 858 KB
• Volume: 87
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.07.040