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Polarized K-Cu XANES of epitaxial Nd1.85Ce0.15CuO4 thin films irradiated by He + ions

โœ Scribed by A.P. Menushenkov; A.Yu. Ignatov; A.A. Ivanov; V.F. Elesin; I.A. Rudnev; D.I. Kochubey

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
195 KB
Volume
84
Category
Article
ISSN
0038-1098

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โœ T. Sato; A. Shimizu; K. Nakamura; K. Hiraoka ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 187 KB ๐Ÿ‘ 1 views

Secondary ions produced by low-energy He + and Ne + ion impact on van der Waals solid thin films deposited on a silicon substrate were measured as a function of film thickness using a reflectron-type time-of-flight mass spectrometer. The intensities of secondary ions N + and N 3 + produced by 400 eV