Plasma reactor design for the selective etching of SiO2 on Si : Rudolph A. H. Heinecke. Solid-St. Electron.19, 1039 (1976)

• Publisher: Elsevier Science
• Year: 1977
• Tongue: English
• Weight: 118 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(77)90056-7