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Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge-Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma

✍ Scribed by Okigawa, Mitsuru; Ishikawa, Yasushi; Samukawa, Seiji


Book ID
111900598
Publisher
Institute of Pure and Applied Physics
Year
2003
Tongue
English
Weight
302 KB
Volume
42
Category
Article
ISSN
0021-4922

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