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Plasma ion implantation hydrogenation of poly-Si CMOS thin-film transistors at low energy and high dose rate using an inductively-coupled plasma source
✍ Scribed by Shu Qin; Yuanzhong Zhou; Nakatsugawa, T.; Husein, I.F.; Chung Chan; Tsu-Jae King
- Book ID
- 114537301
- Publisher
- IEEE
- Year
- 1998
- Tongue
- English
- Weight
- 118 KB
- Volume
- 45
- Category
- Article
- ISSN
- 0018-9383
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