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Plasma etching of dielectric films using the non-global-warming gas CF3I

✍ Scribed by A. Misra; J. Sees; L. Hall; R.A. Levy; V.B. Zaitsev; K. Aryusook; C. Ravindranath; V. Sigal; S. Kesari; D. Rufin


Book ID
117358407
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
123 KB
Volume
34
Category
Article
ISSN
0167-577X

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