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Plasma deposition of fluorocarbon thin films from c-C[sub 4]F[sub 8] using pulsed and continuous rf excitation

✍ Scribed by Labelle, Catherine B.; Opila, Robert; Kornblit, Avi


Book ID
121845468
Publisher
AVS (American Vacuum Society)
Year
2005
Tongue
English
Weight
479 KB
Volume
23
Category
Article
ISSN
0734-2101

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