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Plasma characterization of a high-pressure d(-Sputtering system used for the “in situ” preparation of high-Tc superconducting thin films

✍ Scribed by D. Giratá; Y. Rojas; E. Bacca; M. Chacón; W. Lopera; P. Prieto; J. Heiras


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
372 KB
Volume
90
Category
Article
ISSN
0038-1098

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