✦ LIBER ✦
Plasma-based dry etching techniques in the silicon integrated circuit technology : G. S. Oehrlein and J. F. Rembetski. IBM Journal of Research and Development, 36(2), 140 (1992)
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 217 KB
- Volume
- 33
- Category
- Article
- ISSN
- 0026-2714
No coin nor oath required. For personal study only.